Velasco, A.
(2011).
 Parametric and Kinetic Study of Silicon Nitride Film Deposition on Silicon Wafer by Low Pressure Chemical Vapor Deposition (LPCVD) Method.
<em>Philippine Engineering Journal, 23</em>(1).
Retrieved from <a href="https://journals.upd.edu.ph/index.php/pej/article/view/2383" target="_new">https://journals.upd.edu.ph/index.php/pej/article/view/2383</a>