Thin Film Formation of Gallium Nitride Using Plasma-Sputter Deposition Technique
Abstract
The formation of gallium nitride (GaN) thin film using plasma-sputter deposition technique has been confirmed. The GaN film deposited on a glass substrate at an optimum plasma condition has shown x-ray diffraction (XRD) peaks at angles corresponding to that of (002) and (101) reflections of GaN. The remaining material on the sputtering target exhibited XRD reflections corresponding to that of bulk GaN powder. To improve the system’s base pressure, a new UHV compatible system is being developed to minimize the impurities in residual gases during deposition. The sputtering target configuration was altered to allow the monitoring of target temperature using a molybdenum (Mo) holder, which is more stable against Ga amalgam formation than stainless steel.
Published
2007-07-16
Issue
Section
Articles
Submission of a manuscript implies: that the work described has not been published before (except in the form of an abstract or as part of a published lecture, review, or thesis); that it is not under consideration for publication elsewhere; that its publication has been approved by all co-authors, if any, as well as by the responsible authorities at the institute where the work has been carried out; that, if and when the manuscript is accepted for publication, the authors agree to the automatic transfer of the copyright to the publisher; that the manuscript will not be published elsewhere in any language without the consent of the copyright holders; that written permission of the copyright holder is obtained by the authors for material used from other copyrighted sources; and that any costs associated with obtaining this permission are the authors’ responsibility.