Geometric Study on Silicon Nanowires Fabricated via Silver-assisted Electroless Etching

  • Neil Irvin F. Cabello University of the Philippines Diliman
  • Eloise P. Anguluan University of the Philippines Diliman
  • Joseph Christopher R. Ragasa University of the Philippines Diliman
  • Philippe Martin B. Tingzon University of the Philippines Diliman
  • Kerr A. Cervantes University of the Philippines Diliman
  • Arvin Jay S. Escolano University of the Philippines Diliman
  • Arnel A. Salvador University of the Philippines Diliman
  • Armando S. Somintac University of the Philippines Diliman

Abstract

Controlling the geometry of silicon nanowires (SiNWs) has been of paramount necessity for the viability of mass-producing nanostructured devices. The length, radius, and crystallinity of SiNWs grown via onestep and two-step electroless chemical etching of p-type Si(100) in this study were controlled by varying the concentrations of etchants and etching times. Scanning electron microscope images conf irmed that the length of the nanowires varied directly with increasing concentrations of HF and AgNO3 for the one-step etching process, and HF, H2O2, and AgNO3 for the two-step etching process. Diameters cannot be controlled via the electroless etching methods in the one-step process, but can be manipulated in the two-step process to some extent. X-ray diffractometry analysis exhibited that the SiNW's peak broadening can be attributed to the slight degradation of crystallinity of SiNWs compared to bulk silicon. From the Raman spectra, SiNWs, regardless of their geometric parameters, make excellent thermo-insulators due to the one-directional movement of phonons. The slight shift in peaks can be attributed to laser heating. Finally, photoluminescence analysis of SiNWs demonstrated that the length of the SiNWs varied the ratio of the surface defects of both the one-step and two-step processes, but not the intensity.

Keywords: Nanowires (81.07.GF), silicon nanowires (78.67.Uh), silver nanoparticles (78.67.Bf )

Published
2017-06-16
Issue
Vol 29 No 1 (2017)
Section
Articles
Submission of a manuscript implies: that the work described has not been published before (except in the form of an abstract or as part of a published lecture, review, or thesis); that it is not under consideration for publication elsewhere; that its publication has been approved by all co-authors, if any, as well as by the responsible authorities at the institute where the work has been carried out; that, if and when the manuscript is accepted for publication, the authors agree to the automatic transfer of the copyright to the publisher; that the manuscript will not be published elsewhere in any language without the consent of the copyright holders; that written permission of the copyright holder is obtained by the authors for material used from other copyrighted sources; and that any costs associated with obtaining this permission are the authors’ responsibility.

Most read articles by the same author(s)