Localization and Imaging of Integrated Circuit Defect Using Simple Optical Feedback Detection
Abstract
High-contrast microscopy of semiconductor and metal edifices in integrated circuits is demonstrated by combining laser-scanning confocal reflectance microscopy, one-photon optical-beam-induced current (1P-OBIC) imaging, and optical feedback detection via a commercially available semiconductor laser that also serves as the excitation source. The confocal microscope has a compact in-line arrangement with no external photodetector. Confocal and 1P-OBIC images are obtained simultaneously from the same focused beam that is scanned across the sample plane. Image pairs are processed to generate exclusive high-contrast distributions of the semiconductor, metal, and dielectric sites in a GaAs photodiode array sample. The method is then utilized to demonstrate defect localization and imaging in an integrated circuit.
Published
2007-07-12
How to Cite
CEMINE, Vernon Julius et al.
Localization and Imaging of Integrated Circuit Defect Using Simple Optical Feedback Detection.
Science Diliman: A Journal of Pure and Applied Sciences, [S.l.], v. 16, n. 2, july 2007.
ISSN 2012-0818.
Available at: <https://journals.upd.edu.ph/index.php/sciencediliman/article/view/104>. Date accessed: 04 aug. 2025.
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